发明名称 |
Apparatus for forming a striation reduced chemical mechanical polishing pad |
摘要 |
The present invention provides an apparatus for forming a chemical mechanical polishing pad, comprising a tank with polymeric materials, a storage silo with microspheres and a curative storage tank with curing agents. The apparatus further provides a premix prep tank for forming a pre-mixture of the polymeric materials and the microspheres and a recirculation loop in the premix prep tank for recirculating the pre-mixture until a desired bulk density is reached. The apparatus further provides a premix run tank for storing the pre-mixture, a mixer for forming a mixture of the pre-mixture and the curing agents and a mold for molding the mixture. |
申请公布号 |
US7275928(B2) |
申请公布日期 |
2007.10.02 |
申请号 |
US20040996199 |
申请日期 |
2004.11.23 |
申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. |
发明人 |
KOLESAR DAVID M.;POST ROBERT L.;SAIKIN ALAN H.;SARAFINAS AARON |
分类号 |
B29C44/06;B01F13/02 |
主分类号 |
B29C44/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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