发明名称 Semiconductor structure with improved on resistance and breakdown voltage performance
摘要 A lateral FET cell is formed in a body of semiconductor material. The lateral FET cell includes a super junction structure formed in a drift region between a drain contact and a body region. The super junction structure includes a plurality of spaced apart filled trenches bounding in part a multiplicity of striped doped regions having opposite or alternating conductivity types.
申请公布号 US7276766(B2) 申请公布日期 2007.10.02
申请号 US20050193725 申请日期 2005.08.01
申请人 SEMICONDUCTOR COMPONENTS INDUSTRIES, L.L.C. 发明人 TU SHANGHUI LARRY;ADAMS JAMES;QUDDUS MOHAMMED;NAIR RAJESH S.
分类号 H01L29/76;H01L29/94;H01L31/00 主分类号 H01L29/76
代理机构 代理人
主权项
地址