发明名称 Control of process timing during manufacturing of magnetic thin film disks
摘要 A method is presented for controlling process delay times between a) thin film deposition and lubricant application, and b) lubricant application and abrasive polishing. Applicants have discovered that for certain lubricants, a minimum delay time after the overcoat has been deposited before the lubricant is applied increases the number of disks passing the glide test after abrasive polishing. In addition, applicants have discovered that for certain lubricants, the abrasive polishing should take place within a maximum time window following the application of the lubricant. A computerized work-in-progress tracking system is preferably used to implement the method of the invention.
申请公布号 US7276262(B2) 申请公布日期 2007.10.02
申请号 US20030676879 申请日期 2003.09.30
申请人 HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.V. 发明人 GIORGI ALAN P.;GREEN PAUL M.;HELF GARTH W.;O'BRIEN ERIC C.;PAN QIN;SMITH ANTHONY L.;WALTMAN ROBERT J.
分类号 B05D1/36;G11B5/84 主分类号 B05D1/36
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