发明名称 |
INTEGRATED CIRCUIT ISOLATION SYSTEM |
摘要 |
<p>A method of manufacturing a self-aligned inverted T-shaped isolation structure. An integrated circuit isolation system including providing a substrate, forming a base insulator region in the substrate, and depositing an insulator column having a narrower width than the base insulator region on the base insulator region.</p> |
申请公布号 |
SG135158(A1) |
申请公布日期 |
2007.09.28 |
申请号 |
SG20070015316 |
申请日期 |
2007.03.01 |
申请人 |
CHARTERED SEMICONDUCTOR MANUFACTURING LTD.;INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
FU CHONG YUNG;ZHIJIONG LUO |
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