发明名称 INTEGRATED CIRCUIT ISOLATION SYSTEM
摘要 <p>A method of manufacturing a self-aligned inverted T-shaped isolation structure. An integrated circuit isolation system including providing a substrate, forming a base insulator region in the substrate, and depositing an insulator column having a narrower width than the base insulator region on the base insulator region.</p>
申请公布号 SG135158(A1) 申请公布日期 2007.09.28
申请号 SG20070015316 申请日期 2007.03.01
申请人 CHARTERED SEMICONDUCTOR MANUFACTURING LTD.;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 FU CHONG YUNG;ZHIJIONG LUO
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