发明名称 PHOTOSENSITIVE COMPOSITION, PATTERN FORMING MATERIAL, PHOTOSENSITIVE LAMINATE, PATTERN FORMING METHOD AND PLASMA DISPLAY
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive composition which achieves high resolution and high sensitivity to a blue-violet laser, is not photosensitive under a yellow safe light in pattern formation by blue-violet laser exposure, and is suitable for use in the manufacture of a plasma display, by incorporating a new combination series as a photopolymerization initiation series into a photosensitive composition, and to provide a pattern forming material, a photosensitive laminate, a pattern forming method and a plasma display. <P>SOLUTION: The photosensitive composition contains a binder, a polymerizable compound, a photopolymerization initiation based compound and inorganic particles, wherein the photopolymerization initiation based compound contains at least one of oxime derivatives represented by formula (Ia) and formula (Ib) and at least one of an acridone derivative represented by formula (IIa) and a thioxanthone derivative represented by formula (IIb). The pattern forming material includes a support and a photosensitive layer comprising the photosensitive composition on the support. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007248516(A) 申请公布日期 2007.09.27
申请号 JP20060067890 申请日期 2006.03.13
申请人 FUJIFILM CORP 发明人 IWASAKI MASAYUKI
分类号 G03F7/031;G03F7/004;G03F7/038;H01J9/02;H01J11/02;H01J11/12;H01J11/22;H01J11/24;H01J11/26;H01J11/34;H01J11/36;H01J11/38;H01J11/40;H01J11/42;H01J11/44;H01J11/50 主分类号 G03F7/031
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