| 摘要 |
PROBLEM TO BE SOLVED: To reduce drift caused by charging and improve accuracy in the measurement of a pattern, by extremely shortening a time for automatically focusing an electron beam on a target flat inspection object and by securely automatically adjusting the focal point of the electron beam and shortening the focusing time even under different charging conditions and so on due to the difference in type of target flat inspection object. SOLUTION: The focus adjustment method and focus adjustment device includes: a step in which the focus adjustment information of a target flat inspection object is calculated based upon the inclinations of the X and Y directions of the flat surface of the target flat inspection object, measured and registered in advance, the position (X, Y, Z) of a focal point, and focus information obtained when an electronic beam is focused on an arbitrary part of the target flat inspection object mounted on a stage; and a step in which based upon the calculated focus adjustment information of the target flat inspection object, an electron beam is adjusted to a focal point at the arbitrary part (X, Y) of the target flat inspection object. COPYRIGHT: (C)2007,JPO&INPIT |
