发明名称 METHOD AND APPARATUS FOR PRODUCING MICRO-TEXTURE ON SLIDER SUBSTRATE USING CHEMICAL MECHANICAL POLISHING TECHNIQUES
摘要 <P>PROBLEM TO BE SOLVED: To provide a method and an apparatus for producing an optimum amount of micro-texture correctly on a slider substrate in an excellent cost-effectiveness manner. <P>SOLUTION: The method comprises a step of formulating abrasive slurry of predetermined acidity (or pH value), a step of treating a chemical mechanical polishing pad with the abrasive slurry, a step of disposing magnetic heads on the chemical mechanical polishing pad and a step of lapping and grinding the magnetic heads for a predetermined period of time. The step of lapping and grinding the magnetic heads is accomplished using the apparatus comprising an abrasive slurry solution of predetermined acidity (or pH value) and the chemical mechanical polishing pad treated with the abrasive slurry solution, wherein the magnetic heads are attached to a fixture capable of disposing the magnetic heads on the chemical mechanical polishing pad. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007250174(A) 申请公布日期 2007.09.27
申请号 JP20070069398 申请日期 2007.03.16
申请人 SHINKA JITSUGYO KK 发明人 MAHADEV NIRAJ;JOSE WINSTON;YASUDA KAZUMASA;AYALA RUDY;NGUYEN TAM
分类号 G11B5/60;B24B37/04 主分类号 G11B5/60
代理机构 代理人
主权项
地址