发明名称 |
Method for controlling semiconductor manufacturing apparatus and control system of semiconductor manufacturing apparatus |
摘要 |
A method for controlling a semiconductor manufacturing apparatus for processing wafers divided for each lot, has acquiring quality control value data group containing quality control value data of wafers in a plurality of lots previously processed, and an equipment engineering system parameter group containing equipment engineering system parameters corresponding to the wafers; creating a prediction formula of quality control value data, acquiring a first equipment engineering system parameters; inputting the first equipment engineering system parameters to the prediction formula, and performing calculation to predict first quality control value data of the wafers in the first lot; determining processing of the wafers corresponding to the first quality control value data; acquiring measured first quality control value data of the wafers in the first lot; replacing the quality control value data corresponding to the wafers in the first processed lot; updating the prediction formula.
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申请公布号 |
US2007225853(A1) |
申请公布日期 |
2007.09.27 |
申请号 |
US20070714231 |
申请日期 |
2007.03.06 |
申请人 |
MATSUSHITA HIROSHI;SUGAMOTO JUNJI;ASANO MASAFUMI |
发明人 |
MATSUSHITA HIROSHI;SUGAMOTO JUNJI;ASANO MASAFUMI |
分类号 |
G06F19/00;H01L21/02;H01L21/027 |
主分类号 |
G06F19/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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