Methods for etching a bottom anti-reflective coating layer in dual damascene application

摘要

Methods for two step etching a BARC layer in a dual damascene structure are provided. In one embodiment, the method includes providing a substrate having vias filled with a BARC layer disposed on the substrate in an etch reactor, supplying a first gas mixture into the reactor to etch a first portion of the BARC layer filling in the vias, and supplying a second gas mixture comprising NH₃ gas into the reactor to etch a second portion of the BARC layer disposed in the vias.