发明名称 SCANNING ELECTRON MICROSCOPE
摘要 PROBLEM TO BE SOLVED: To materialize high resolving power (low aberration) in an objective in which a sample is disposed on the further electron gun side than the inside magnetic pole and the outside magnetic pole of the objective. SOLUTION: A keynote for designing the magnetic field type lens is how to strengthen B in a magnetic flux distribution B(z) on the optical axis of the lens, and how to thin the thickness of the lens (that is, the z width of the B distribution). For this purpose, a magnetic field is required to be concentrated on the vicinity of an electron beam irradiating portion on a sample by reviewing the shape and disposition of the inside magnetic pole and the outside magnetic pole of the objective 13. For this purpose, first the inside magnetic pole 13a is formed into a truncated cone as shown in Fig. 4, and the sample 12 is disposed near the base side of the truncated cone. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007250223(A) 申请公布日期 2007.09.27
申请号 JP20060068484 申请日期 2006.03.14
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 ISHITANI TORU;SATO MITSUGI;TAKEUCHI KOICHIRO
分类号 H01J37/141;H01J37/073 主分类号 H01J37/141
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