| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of preventing (reducing) the refractive index distribution and the thermal deformation occurring in a projection optical system (final optical element) to realize excellent resolution and productivity, though it has a simple structure. <P>SOLUTION: This exposure apparatus comprises an illumination optical system for illuminating a reticle with a luminous flux emitted from a first light source, and the projection optical system for projecting the pattern of the reticle on a workpiece; and exposes the workpiece via a liquid supplied to between the final optical element on the side of the projection optical system nearest to the workpiece and the workpiece. This exposure apparatus comprises a second light source for emitting a luminous flux having a wavelength different from that of the luminous flux from the first light source, and an illumination optical system for irradiating the final optical element with the luminous flux from the second light source. <P>COPYRIGHT: (C)2007,JPO&INPIT |
