发明名称 |
Festphasenimmersionslinsenlithographie |
摘要 |
<p>Lithography using solid immersion lenses is disclosed. In one aspect, an apparatus is provided that includes a resist film that has a first side and a second and opposite side. One or more solid immersion lenses are positioned over the first side of the resist film. In another aspect, a method of manufacturing is provided that includes forming a resist film and exposing the resist film with radiation transmitted through one or more solid immersion lenses.</p> |
申请公布号 |
DE112005002469(T5) |
申请公布日期 |
2007.09.27 |
申请号 |
DE20051102469T |
申请日期 |
2005.06.23 |
申请人 |
ADVANCED MICRO DEVICES INC. |
发明人 |
GORUGANTHU, RAMA R.;BRUCE, MICHAEL R. |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|