OXIDE SINTERED COMPACT, METHOD FOR MANUFACTURING THE SAME, METHOD FOR MANUFACTURING OXIDE TRANSPARENT CONDUCTIVE FILM, AND OXIDE TRANSPARENT CONDUCTIVE FILM

摘要

PROBLEM TO BE SOLVED: To provide an oxide sintered compact with which crazing and cracking do not occur in spite of feeding of a large amount of energies in manufacturing the oxide transparent conductive film by a vacuum vapor deposition method, such as an electron beam vapor deposition method, ion plating method, high-density plasma-assisted vapor deposition method or the like.

SOLUTION: The oxide sintered compact contains an indium oxide formed by solid-solubilizing molybdenum, in which the molybdenum is contained at ≥0.001 and ≤0.060 in the ratio of molybdenum atoms to indium, the density is ≥3.7 g/cm3and ≤6.5 g/cm3, and a metal phase and a crystal phase of a molybdenum oxide are not included.

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