| 摘要 |
<P>PROBLEM TO BE SOLVED: To clamp a patterning device without deforming it in a lithographic apparatus. <P>SOLUTION: A first surface of a mask in the lithographic apparatus is clamped using a first clamp device, and a second surface different from the first surface is clamped using a second clamp device. A clamp force is preferably applied using a thin film. The first clamp device clamps a substrate from a direction parallel to a plane of the patterning device, a direction perpendicular to the plane of the patterning device and a rotational direction. The second clamp device clamps the patterning device only in the direction parallel to the substrate plane. <P>COPYRIGHT: (C)2007,JPO&INPIT |
