发明名称 SUBSTRATE PROCESSING APPARATUS, CLEANING METHOD THEREOF, AND RECORDING MEDIUM RECORDING PROGRAM THEREON
摘要 PROBLEM TO BE SOLVED: To provide optimum cleaning for each type of processing by doing cleaning according to types of processing. SOLUTION: The cleaning in a process chamber which is executed after a substrate is carried in for a specified process comprises a setting information storing means which stores cleaning setting information which can be set for each type of processes executed in the process chamber. The type of process executed in the process chamber is discriminated when executing cleaning in the process chamber. The cleaning setting information corresponding to the type of discriminated process is acquired from the setting information storing means. Based on the acquired cleaning setting information, cleaning is executed according to the type of process. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007250791(A) 申请公布日期 2007.09.27
申请号 JP20060071513 申请日期 2006.03.15
申请人 TOKYO ELECTRON LTD 发明人 IIJIMA KIYOHITO
分类号 H01L21/3065 主分类号 H01L21/3065
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