发明名称 |
COPPER ELECTROLYTE, METHOD FOR MANUFACTURING ADDITIVE USED FOR COPPER ELECTROLYTE, AND ELECTRODEPOSITION COPPER FILM OBTAINED BY USING THE COPPER ELECTROLYTE |
摘要 |
PROBLEM TO BE SOLVED: To provide a sulfuric acid-based copper electrolyte capable of stably yielding a uniform electrodeposition copper film as the electrolyte has an equivalent gloss as compared to the conventional sulfuric acid-based copper electrolyte. SOLUTION: The sulfuric acid-based copper electrolyte includes a bis(3-sulfopropyl)disulfide component. The conventional sulfuric acid-based copper electrolyte added with the As the supply source of bis(3-sulfopropyl)disulfide component, a bis(3-sulfopropyl)disulfide copper hydrate is used. The bis(3-sulfopropyl)disulfide copper hydrate is manufactured by a process of causing crystallization using an organic solvent from a solution mixture prepared by adding a cupric chloride to an aqueous 3-mercapto-1-propane sodium sulfate. COPYRIGHT: (C)2007,JPO&INPIT
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申请公布号 |
JP2007247007(A) |
申请公布日期 |
2007.09.27 |
申请号 |
JP20060073528 |
申请日期 |
2006.03.16 |
申请人 |
MITSUI MINING & SMELTING CO LTD |
发明人 |
YOSHIDA ASAMI;SAKAI HISAO;NISHIDA TAKUMA |
分类号 |
C25D3/38;C07C319/24;C07C319/28;C07C323/66;C07F1/08;C25D1/04;H05K3/00 |
主分类号 |
C25D3/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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