发明名称 RESIN COMPOSITION AND METHOD FOR FORMING RELIEF PATTERN USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a resin composition carrying out a heat treatment at a low temperature of≤250°C and having excellent crack and peel resistances to a treatment with an organic chemical. SOLUTION: The resin composition is characterized by comprising (a) a polyimide precursor and/or a polybenzoxazole precursor, (b) metal compound particles and (c) a heat acid generator. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007246651(A) 申请公布日期 2007.09.27
申请号 JP20060070784 申请日期 2006.03.15
申请人 TORAY IND INC 发明人 KANATSUKI SHIGEYOSHI;SUWA MITSUFUMI
分类号 C08L79/08;C08K3/22;C08K5/00;C08L79/04;G02B1/04;H05K3/00 主分类号 C08L79/08
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