发明名称 |
RESIN COMPOSITION AND METHOD FOR FORMING RELIEF PATTERN USING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a resin composition carrying out a heat treatment at a low temperature of≤250°C and having excellent crack and peel resistances to a treatment with an organic chemical. SOLUTION: The resin composition is characterized by comprising (a) a polyimide precursor and/or a polybenzoxazole precursor, (b) metal compound particles and (c) a heat acid generator. COPYRIGHT: (C)2007,JPO&INPIT
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申请公布号 |
JP2007246651(A) |
申请公布日期 |
2007.09.27 |
申请号 |
JP20060070784 |
申请日期 |
2006.03.15 |
申请人 |
TORAY IND INC |
发明人 |
KANATSUKI SHIGEYOSHI;SUWA MITSUFUMI |
分类号 |
C08L79/08;C08K3/22;C08K5/00;C08L79/04;G02B1/04;H05K3/00 |
主分类号 |
C08L79/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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