发明名称 |
Analog silicon-on-insulator semiconductor circuit arrangement, has diode doped region formed in active semiconductor region of specific conductive type up to surface of insulating layer, and measuring diode realized over diode side |
摘要 |
<p>The arrangement has an insulating layer (2) formed on a semiconductor substrate (1). An active semiconductor region (AA) is formed on the insulating layer. Source and drain regions of a multi-gate FET are formed in the active region. A diode doped region is formed in the active semiconductor region of a specific conductive type up to a surface of the insulating layer. A measuring diode is realized over a diode side with the source and drain regions and is bordered at a side by another insulating layer (4). An independent claim is also included for a method for temperature determination in a semiconductor circuit arrangement.</p> |
申请公布号 |
DE102006013721(A1) |
申请公布日期 |
2007.09.27 |
申请号 |
DE20061013721 |
申请日期 |
2006.03.24 |
申请人 |
INFINEON TECHNOLOGIES AG |
发明人 |
ARNIM, KLAUS VON;SCHULZ, THOMAS;PACHA, CHRISTIAN |
分类号 |
H01L23/58;G01K7/01;H01L21/66;H01L23/544;H01L27/06 |
主分类号 |
H01L23/58 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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