| 摘要 |
PROBLEM TO BE SOLVED: To provide a system capable of supplying both deionized water rarely including dissolved gas and deionized water including dissolved gas without increasing the amount of ionized water to be produced in a semiconductor mass production factory. SOLUTION: To supply deionized water, this deionized water supply system comprises a deionized water production means for producing deionized water with a dissolved gas density of 0.4 ppm or less, a first deionized water supply means capable of supplying the deionized the water produced by the deionized water production means, a dissolution means which is connected by the deionized water supply means and linkage for dissolving gas in the deionized water carried via the linkage from the deionized water production means and a second deionized water supply means capable of supplying the deionized water with gas dissolved by the dissolution means. COPYRIGHT: (C)2007,JPO&INPIT
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