发明名称 FILM THICKNESS MEASURING METHOD AND DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a film thickness measuring method and so forth capable of precisely measuring a thickness of a light transmitting film provided on a support substrate. SOLUTION: In the film thickness measuring method for measuring the film thickness of the film having light transmitting properties provided on the support substrate, light is incident on the film, reflected light obtained by interference between the light reflected by a surface of the film and the light reflected by a surface of the support substrate is dispersed, the amount of light of the separated reflected light is detected, wavelengths where the reflectance is at the minimum or the maximum are acquired by magnifying reflectance at an arbitrary size when calculating the reflectance from the amount of light, and the wavelengths at which the reflectance is at the minimum and the maximum and refractive index of the film are used to measure the thickness of the film. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007248312(A) 申请公布日期 2007.09.27
申请号 JP20060073410 申请日期 2006.03.16
申请人 RICOH CO LTD 发明人 TOMOTA MITSUHIRO
分类号 G01B11/06;G03G5/00;G03G5/10 主分类号 G01B11/06
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