Positive Resist Compositions and Process for the Formation of Resist Patterns With the Same

摘要

A positive resist composition that includes a resin component (A) and an acid-generator component (B), wherein the component (A) is a copolymer that includes a structural unit (a1) derived from a mono(alpha-lower alkyl)acrylate that contains an acid-dissociable, dissolution-inhibiting group, a structural unit (b1) derived from a mono(alpha-lower alkyl)acrylate that contains a lactone ring, and a structural unit (c1) derived from a poly(alpha-lower alkyl)acrylate. A positive resist composition that includes a resin component (A) and an acid generator component (B), wherein the component (A) is a star polymer that includes a core that contains acid-dissociable, dissolution-inhibiting groups, and arms that are bonded to the core.