| 摘要 |
PROBLEM TO BE SOLVED: To obtain a patterning distribution similar to that obtained by a sheet-fed type CDE machine without extensively remodeling the CDE machine while an organic film is used as an ink blocking layer and an adhesion layer for an ink channel forming film in a method for manufacturing an inkjet recording head, the etching distribution of an organic film is generally bad, and a patterning width is out of a regulation if the patterning distribution is not limited within a range of at least 15% in the inkjet recording head. SOLUTION: There is provided a nozzle section of an etching gas for blowing the radicalized etching gas in a treatment chamber so as to uniformly reach an object to be treated, and a control plate for controlling the etching gas so as to allow the etching gas to uniformly flow. COPYRIGHT: (C)2007,JPO&INPIT
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