| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition having an improved exposure latitude and pattern shape in normal exposure and in liquid immersion exposure and an improved sensitivity and dissolution contrast in EUV light exposure for use in a semiconductor manufacturing process, a process for manufacturing a circuit board used for a liquid crystal, a thermal head or the like and a photo-fabrication process other than the above, a pattern forming method using the photosensitive composition, and a chemical compound of a specific structure constituting the photosensitive composition. <P>SOLUTION: A photosensitive composition comprising a chemical compound of a specific structure, a pattern forming method using the photosensitive composition, and a chemical compound of a specific structure constituting the photosensitive composition are disclosed. <P>COPYRIGHT: (C)2007,JPO&INPIT |
