| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of excellently aligning patterns and highly efficiently performing multiple exposure of a substrate. <P>SOLUTION: The exposure apparatus EX is provided with a projection optical system PL capable of forming an image of a first pattern PA1 on a first exposure region AR1 and forming an image of a second pattern PA2 different from that of the first pattern PA1 on a second exposure region AR2; and a first detecting system 10 for obtaining at least any one of position information of the image of the first pattern PA1 and position information of the image of the second pattern PA2. The apparatus EX adjusts the position relation between the images of the first and second patterns PA1, PA2 and a predetermined region S on a substrate P on the basis of a result of detection, and performs multiple exposure for the predetermined region S on the substrate P using the images of the first and second patterns PA1, PA2. With this configuration, multiple exposure can be highly efficiently performed for the substrate. <P>COPYRIGHT: (C)2007,JPO&INPIT |
