CERAMIC COVERED MEMBER FOR SEMI-CONDUCTOR MACHINING APPARATUS

摘要

PROBLEM TO BE SOLVED: To enhance durability of a member arranged in a container such as a semi-conductor machining apparatus in which plasma etching is performed under a severe corrosive environment.

SOLUTION: A ceramic-covered member has a porous layer composed of a spray deposit film of IIIa group oxide in the periodic table on the surface of a metallic or non-metallic base material directly or via an undercoat layer. A secondary recrystallization layer formed through irradiation of the high energy of electron beams, laser beams or the like is deposited on the porous layer.

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