发明名称 MULTILAYERED STRUCTURE AND MANUFACTURING METHOD OF THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a multilayered structure excellent in gas barrier property. SOLUTION: The multilayered structure is the one which has a substrate layer, which is formed by laminating, onto at least one face of the substrate layer, a first layer consisting of a first material comprising a first inorganic layered compound and, adjacently to the first layer, a second layer consisting of a second material comprising a second inorganic layered compound and a second resin, and which satisfies the following conditions (1)-(3). Here, (1): the second layer is the outermost layer and the volume fraction of the second inorganic layered compound in the second layer is 5-30 vol%, (2): the volume fraction of the first inorganic layered compound in the first layer is higher than that of the second inorganic layered compound in the second layer, and (3): the second resin in the second layer is a water-soluble resin containing two or more functional groups. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007245554(A) 申请公布日期 2007.09.27
申请号 JP20060072573 申请日期 2006.03.16
申请人 SUMITOMO CHEMICAL CO LTD 发明人 OSAKI NOBUHIRO;NANBU KIMINARI
分类号 B32B27/20;B65D65/40 主分类号 B32B27/20
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