| 发明名称 |
Substrate patterning for multi-gate transistors |
| 摘要 |
Some embodiments of the present invention include apparatuses and methods relating to improved substrate patterning for multi-gate transistors.
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| 申请公布号 |
US2007224815(A1) |
申请公布日期 |
2007.09.27 |
| 申请号 |
US20060388526 |
申请日期 |
2006.03.23 |
| 申请人 |
BAN IBRAHIM;SHAH UDAY;GARDINER ALLEN B |
发明人 |
BAN IBRAHIM;SHAH UDAY;GARDINER ALLEN B. |
| 分类号 |
H01L21/302;H01L21/461 |
主分类号 |
H01L21/302 |
| 代理机构 |
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| 主权项 |
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