| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing pad capable of detecting a working end-point in polishing, having high in-plane uniformity of polishing speed and having a secured pad service life in polishing, and its manufacturing method. <P>SOLUTION: The polishing pad comprises a polishing layer having a foaming structure, which has a region having the same composition as that of its surrounding region and lower foaming characteristic than that of the surrounding region. <P>COPYRIGHT: (C)2007,JPO&INPIT |
