| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate holding and rotating apparatus capable of surely holding and rotating a substrate at a regular position without excessively enhancing the processing precision and the positional precision of individual holding rollers for holding the substrate. SOLUTION: A first substrate holding and rotating apparatus 1 comprises four holding rollers 6 and 7 for pinching and holding the substrate W by abutting the circumferential end surface of the substrate W. Two rollers 6 are rotatably and integrally held by a roller holding member 56. The remaining two holding rollers 7 are rotatably held by arms 34 respectively, and the driving force of a second or a third cylinder 13, 14 is transmitted thereto via a coil spring 41. The holding rollers 7 are pressed against the circumferential end surface of the substrate W positioned at a regular position by the holding rollers 6 and elastically abut it. Further, the holding rollers 7 can follow the circumferential end surface of the substrate W because the coil springs 41 can extend and contract. COPYRIGHT: (C)2007,JPO&INPIT |
