| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition having high sensitivity, high resolution, and superior dissolution contrast by suppressing, density dependence and to provide a pattern-forming method using it. <P>SOLUTION: The positive resist composition contains a resin increasing dissolubility to alkaline developer by action of dissolution to organic solvent and acid, and a compound generating acid by irradiation of an active optical beam or radiation. The resin (A) has a structure cross-linked by a cross-linking group. The cross-linking group has an aromatic ring and has an acid decomposition group generating an alkaline dissoluble group by being decomposed by action of acid. <P>COPYRIGHT: (C)2007,JPO&INPIT |
