| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus in which a treatment liquid supplied to a substrate can be removed certainly and collected efficiently by a relatively simple arrangement, and the in-plane uniformity of treatment by the treatment liquid can be enhanced. SOLUTION: A development unit comprises a passage 5 for conveying a substrate G while directing the treated surface upward, a mechanism for supplying a developer to the substrate G conveyed on the conveyance passage 5, and a mechanism 65 for sucking the developer on the substrate G conveyed on the conveyance passage 5. The conveyance passage 5 has a valley folder P1 for altering an inclination angle in the conveyance direction so that the substrate G is curved or bent to the valley side during passage, the developer supply mechanism supplies the developer on the upstream side of the valley folder P1, and the developer suction mechanism 65 sucks the developer at the position of the valley folder P1 or a position in proximity thereto. COPYRIGHT: (C)2007,JPO&INPIT |
