APPARATUS, SYSTEM, AND METHOD FOR SUBSTRATE TREATMENT

摘要

PROBLEM TO BE SOLVED: To efficiently inspect an object which is likely to interfere with a slit nozzle. SOLUTION: A substrate treatment apparatus 1 which discharges a resist liquid from the slit nozzle 41 is provided with a detection sensor 45 and an imaging portion 6. An object which is likely to interfere with the slit nozzle 41 is detected by the detection sensor 45, and the position in the X-axis direction of the object is identified as a detected position from the position in the X-axis direction of the detection sensor 45 when the object was detected by the detection sensor 45. Based on the identified detected position, the imaging portion 6 is moved in the X-axis direction. Furthermore, while moving a camera 63 in the Y-axis direction, a detection region including the object is photographed by the camera 63 to acquire image data for inspection. By displaying the acquired image data for inspection, the detected object is inspected. COPYRIGHT: (C)2007,JPO&INPIT