发明名称 Photo-mask`s structural unit transmitting arrangement for integrated circuit, has optical unit causing local variation of transmission rate of radiations depending on angle of incidence of radiations with respect to surface of optical unit
摘要 <p>The arrangement has a lighting device (4) for producing radiations (1000), and a photo-mask (2) with a set of structural units (3), where the radiations transmit the structural units to a photo-resist (21) arranged on a substrate (5). An optical unit (6) has a surface (7), and causes a local variation of transmission rate of the radiations depending on an angle of incidence of the radiations with respect to the surface. The optical unit is arranged between the photo-mask and the substrate. An independent claim is also included for a method for transmitting structural units to a substrate.</p>
申请公布号 DE102006013459(A1) 申请公布日期 2007.09.27
申请号 DE20061013459 申请日期 2006.03.23
申请人 INFINEON TECHNOLOGIES AG 发明人 PFORR, RAINER;TSCHISCHGALE, JOERG;KUECHLER, BERND;MUELDERS, THOMAS
分类号 G03F7/20 主分类号 G03F7/20
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