发明名称 Manufacturing method of suspended microstructure
摘要 A manufacturing method of a suspended microstructure includes the steps of providing a substrate having a surface; forming a first depositing layer over a part of the surface; forming a second depositing layer over the first depositing layer and another part of the surface wherein an adhesion between the first depositing layer and the substrate is weaker than that between the second depositing layer and the substrate; forming a hole through the second depositing layer to partially expose the surface of the substrate; and filling the hole with an etchant to remove a part of the substrate so as to form a cavity.
申请公布号 US2007224720(A1) 申请公布日期 2007.09.27
申请号 US20060640849 申请日期 2006.12.19
申请人 DELTA ELECTRONICS, INC. 发明人 LEE CHENG-CHANG;LIAO HSUEH-KUO;CHEN SHIH-PENG;SHING TAI-KANG;CHEN HUANG-KUN
分类号 H01L21/00 主分类号 H01L21/00
代理机构 代理人
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