| 摘要 |
Provided is a crystallized glass spacer for a field emission display resistant to charging with application of an electric field and resistant to chipping or cracking thanks to high fracture toughness. An SiO<SUB>2</SUB>-TiO<SUB>2</SUB>-based glass is subjected to a reduction and crystallization heat treatment at 600-900° C. in a hydrogen atmosphere or in a mixed atmosphere of hydrogen and nitrogen, to obtain a crystallized glass spacer for FED consisting essentially of, in molar percentage, SiO<SUB>2</SUB>: 20-50%, TiO<SUB>2</SUB>: 25-45%, MgO+CaO+SrO+BaO+ZnO: 20-50%, B<SUB>2</SUB>O<SUB>3</SUB>+Al<SUB>2</SUB>O<SUB>3</SUB>: 0-10% and ZrO<SUB>2</SUB>: 0-10%, and containing as a principal crystal at least one crystal selected from Ba<SUB>X</SUB>Ti<SUB>8</SUB>O<SUB>16</SUB>-based crystals (X=0.8-1.5), Ba<SUB>2</SUB>TiSi<SUB>2</SUB>O<SUB>8</SUB>-based crystals and TiO<SUB>2</SUB>-based crystals.
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