| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive silane coupling agent for forming a fine particle pattern, a dot array pattern and a hole array pattern having small defects in small amount of processes and a method for forming the patterns by using the photosensitive silane coupling agent. <P>SOLUTION: The photosensitive silane coupling agent contains a secondary amino group protected with an o-nitrobenzyloxycarbonyl group. Fine particles are selectively arranged in an exposed area 2 by laminating the photosensitive silane coupling agent on the surface of a base board, exposing the photosensitive silane coupling agent layer 2 in a pattern-like shape and generating the secondary amino groups in the exposed area 3. A single electron element, a patterned medium, a chemical sensor, a quantum dot laser element and a photonic crystal optical device are prepared by using the resultant fine particle patterns. <P>COPYRIGHT: (C)2007,JPO&INPIT |
