| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive silane coupling agent for forming a fine particle pattern, a dot-array pattern and a hole-array pattern having small defects in a small number of processes and a method for forming the patterns using the photosensitive silane coupling agent. <P>SOLUTION: The photosensitive silane coupling agent contains 1, 2-naphthoquinone-2-diazido-5-sulfonyl group or 1, 2-naphthoquinone-2-azido-4-sulfonyl group. Fine particles 5 are selectively arranged solely in an exposed area 3 or an unexposed area 4 by laminating the photosensitive silane coupling agent on the surface of a base board 1, exposing the photosensitive silane coupling agent layer 2 in a pattern-like form and generating carboxyl groups in the exposed area 3. Single electron elements, patterned media, chemical sensors, quantum dot laser elements and photonic crystal optical devices are prepared by using the resultant fine particle patterns. <P>COPYRIGHT: (C)2007,JPO&INPIT |
