发明名称 SUBSTRATE PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To form a high-quality, ultrathin oxide film on a substrate. SOLUTION: Deionized water or methanol is used as a solvent, which is mixed with SCCO2 to make a processing solution, and the processing solution is brought into contact with a surface of a substrate W to form an oxide film on the substrate surface (step S13). In this processing solution, SCCO2 is used as a carrier medium, and an -OH functional group (hydroxyl group) exists in the SCCO2 as an active chemical species in a scattering way. The SCCO2, which has so excellent mobility and high density, is used as a carrier medium, and an active chemical species is mixed with that carrier medium. For this reason, the active chemical species is prevented from excessively existing in an environment where it is in contact with the substrate's surface. Further, the active chemical species exists in an excellent diffusive way, and even if the solvent is of a small amount, a large amount of active chemical species is included. Therefore, fresh active chemical species is constantly supplied to the substrate's surface so as to favorably react with the substrate's surface, thus forming an oxide film OF. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007251081(A) 申请公布日期 2007.09.27
申请号 JP20060076006 申请日期 2006.03.20
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 SAITO KIMITSUGU
分类号 H01L21/316 主分类号 H01L21/316
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