发明名称 High performance semiconductor component with secondary passivation layer and associated method of manufacture
摘要 <p>The component has a semiconductor body exhibiting trenches (18) and a primary passivation layer (24), which is arranged on a partial area of a main surface. The primary passivation layer is completely covered by a secondary passivation layer (34) made of a screen printable polyimide. The primary passivation layer is designed as a lead glass layer, where the semiconductor component is designed in a mesa structure or in a planar structure. The polyimide laterally overlaps an edge region of the primary passivation layer. An independent claim is also included for a method for manufacturing a power semiconductor component.</p>
申请公布号 EP1837908(A1) 申请公布日期 2007.09.26
申请号 EP20070005338 申请日期 2007.03.15
申请人 SEMIKRON ELEKTRONIK GMBH & CO. KG 发明人 SIMIC, DEJAN;KOENIG, BERNHARD DR.
分类号 H01L23/31 主分类号 H01L23/31
代理机构 代理人
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