发明名称 |
High performance semiconductor component with secondary passivation layer and associated method of manufacture |
摘要 |
<p>The component has a semiconductor body exhibiting trenches (18) and a primary passivation layer (24), which is arranged on a partial area of a main surface. The primary passivation layer is completely covered by a secondary passivation layer (34) made of a screen printable polyimide. The primary passivation layer is designed as a lead glass layer, where the semiconductor component is designed in a mesa structure or in a planar structure. The polyimide laterally overlaps an edge region of the primary passivation layer. An independent claim is also included for a method for manufacturing a power semiconductor component.</p> |
申请公布号 |
EP1837908(A1) |
申请公布日期 |
2007.09.26 |
申请号 |
EP20070005338 |
申请日期 |
2007.03.15 |
申请人 |
SEMIKRON ELEKTRONIK GMBH & CO. KG |
发明人 |
SIMIC, DEJAN;KOENIG, BERNHARD DR. |
分类号 |
H01L23/31 |
主分类号 |
H01L23/31 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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