发明名称 Deflector, method of its manufacture and its use in a charged particle beam exposure apparatus
摘要 <p>A deflector which makes multilayered wiring possible and prevents contamination during the manufacture includes an electrode substrate (400) having a plurality of through holes, and an electrode pair made up of first and second electrodes which oppose the side walls of each through hole in order to control the locus of a charged particle beam passing through the through hole, and a wiring substrate (500) having connection wiring pads connected to the electrode pairs of the electrode substrate to individually apply voltages to the electrode pairs. This deflector is formed by bonding the electrode substrate and wiring substrate via the connection wiring pads of the wiring substrate. </p>
申请公布号 EP1453076(A3) 申请公布日期 2007.09.26
申请号 EP20040250956 申请日期 2004.02.23
申请人 CANON KABUSHIKI KAISHA;HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 ONO, HARUHITO;AKAIKE, MASATAKE;TAMAMORI, KENJI;HIROSE, FUTOSHI;KOYAMA, YASUSHI;TERASAKI, ATSUNORI;NAGAE, KEN-ICHI;NAKAYAMA, YOSHINORI
分类号 G03F7/20;H01J37/04;H01J37/147;H01J37/305;H01J37/317;H01L21/027 主分类号 G03F7/20
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