发明名称 Lithographic apparatus and device manufacturing method
摘要 A projection system comprises an array of lenses MLA, each lens transmitting a unique part of a patterned beam. Measuring devices measure a distance between the array of lenses MLA and a substrate W. A controller controls an actuator to adjust a position (e.g., height and/or tilt) of the microlens array MLA.
申请公布号 US7274029(B2) 申请公布日期 2007.09.25
申请号 US20040022923 申请日期 2004.12.28
申请人 ASML NETHERLANDS B.V. 发明人 LOF JOERI;DE SMIT JOANNES THEODOOR
分类号 G21K5/10;H01J37/08 主分类号 G21K5/10
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