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发明名称
垂直式环绕闸极结构的半导体元件
摘要
本发明提出一种垂直式环绕闸极结构之半导体元件,此半导体元件包括:柱状基底、领氧化层、金属层、汲极区、接地线、源极区、位元线、字元线、闸极以及闸介电层。其中,接地线系配置于柱状基底之一开口中,并覆盖领氧化层与金属层,且电性连接于柱状基底。汲极区系配置于柱状基底顶部及开口上部中。闸极系配置于字元线、位元线与柱状基底之间。闸介电层系配置于闸极、源极区、汲极区、位元线与柱状基底之间。
申请公布号
TW200735280
申请公布日期
2007.09.16
申请号
TW095108075
申请日期
2006.03.10
申请人
茂德科技股份有限公司
发明人
吴孝哲
分类号
H01L21/8239(2006.01);H01L27/105(2006.01);H01L21/8242(2006.01);H01L27/108(2006.01)
主分类号
H01L21/8239(2006.01)
代理机构
代理人
王宗梅
主权项
地址
新竹市新竹科学工业园区力行路19号3楼
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