Novel Sulfonyldiazomethanes, Photoacid Generators, Resist Compositions, and Patterning Process,申请号KR20040009186-传众专利搜索

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发明名称	Novel Sulfonyldiazomethanes, Photoacid Generators, Resist Compositions, and Patterning Process
摘要
申请公布号	KR100759204(B1)	申请公布日期	2007.09.14
申请号	KR20040009186	申请日期	2004.02.12
申请人		发明人
分类号	G03F7/039;C07C317/28;C08F12/24;G03F7/004;G03F7/038;H01L21/027	主分类号	G03F7/039
代理机构		代理人
主权项
地址

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