发明名称 |
Photomask blank and photomask |
摘要 |
A photomask blank is provided comprising an etch stop film which is disposed on a transparent substrate and is resistant to fluorine dry etching and removable by chlorine dry etching, a light-shielding film disposed on the etch stop film and including at least one layer composed of a transition metal/silicon material, and an antireflective film disposed on the light-shielding film. When the light-shielding film is dry etched to form a pattern, pattern size variation arising from pattern density dependency is reduced, so that a photomask is produced at a high accuracy.
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申请公布号 |
US2007212618(A1) |
申请公布日期 |
2007.09.13 |
申请号 |
US20070715346 |
申请日期 |
2007.03.08 |
申请人 |
TOPPAN PRINTING CO., LTD. |
发明人 |
YOSHIKAWA HIROKI;INAZUKI YUKIO;OKAZAKI SATOSHI;HARAGUCHI TAKASHI;SAGA TADASHI;KOJIMA YOSUKE;CHIBA KAZUAKI;FUKUSHIMA YUICHI |
分类号 |
B32B9/00;B32B17/06;B32B17/10;G03F1/32;G03F1/68 |
主分类号 |
B32B9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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