| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure method capable of suppressing nonuniformity in the line width of an exposure pattern due to flare. <P>SOLUTION: The exposure method for projecting and exposing the prescribed pattern on a substrate with the use of a projection optical system includes: a dispersion characteristic measurement process (S10) for measuring a dispersion characteristic held by the projection optical system; a flare amount distribution calculation process (S11) for calculating a flare amount distribution on the substrate, based on the dispersion characteristic measured in the dispersion characteristic measurement process; a correction dose amount distribution calculation process (S12) for calculating a correction dose amount distribution, based on the flare amount distribution calculated in the flare amount distribution calculation process; and a correction exposure process (S14) for performing correction exposure on the substrate, based on the correction dose amount distribution calculated in the correction dose amount distribution calculation process before or after projecting and exposing the prescribed pattern on the substrate. <P>COPYRIGHT: (C)2007,JPO&INPIT |
