发明名称 EXPOSURE DEVICE AND IMAGE FORMING DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an exposure device with a lens array, which sets an interval between the lens array and an organic EL element to a sufficiently narrow value, and sufficiently improves the reliability thereof. <P>SOLUTION: The exposure device is formed of a plurality of light emitting elements 14, an element substrate 20 on which the light emitting elements 14 are arranged, and a plate-like sealing body 30 making contact with the element substrate 20 to seal the light emitting elements 14. The sealing body 30 defines a closed space SP inclusive of the light emitting elements 14 in cooperation with the element substrate 20. Then each of micro-lenses L makes contact with inert gas filled in a cavity C in the closed space SP and overlaps each light emitting element 14 in a direction perpendicular to the element substrate 20. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007230075(A) 申请公布日期 2007.09.13
申请号 JP20060054433 申请日期 2006.03.01
申请人 SEIKO EPSON CORP 发明人 KOBAYASHI HIDEKAZU
分类号 B41J2/44;B41J2/45;B41J2/455;H01L51/50;H05B33/02;H05B33/04 主分类号 B41J2/44
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