发明名称 |
Base soluble polymers for photoresist compositions |
摘要 |
Base soluble polymer comprising at least one sulfonyl group where at least one carbon atom at alpha-position and/or beta-position and/or gamma-position with respect to the sulfonyl group has a hydroxyl group, where the hydroxyl group is protected or unprotected are described.
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申请公布号 |
US2007212638(A1) |
申请公布日期 |
2007.09.13 |
申请号 |
US20060372680 |
申请日期 |
2006.03.10 |
申请人 |
ABDALLAH DAVID;HOULIHAN FRANCIS |
发明人 |
ABDALLAH DAVID;HOULIHAN FRANCIS |
分类号 |
G03C1/00 |
主分类号 |
G03C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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