| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for improving the micro-bridge of resist which occurs between fine resist patterns. SOLUTION: This developing apparatus for developing a substrate with the resist subjected to pattern exposure applied thereon comprises a development chamber having a development chuck for fixing the substrate and a developer nozzle for discharging a developer, a developer tank, and a temperature controller for adjusting the temperature of the developer to be higher than ordinary temperature. Preferably, the development chuck is provided with a hot plate whose temperature can be adjusted. Further, a developing method adjusts the temperature of the substrate with the resist subjected to pattern exposure applied thereon to be higher than ordinary temperature when it is developed. COPYRIGHT: (C)2007,JPO&INPIT |
