NEW COMPOUND AND RADIATION-SENSITIVE ACID GENERATOR AND POSITIVE TYPE RADIATION-SENSITIVE RESIN COMPOSITION EACH USING THE COMPOUND

摘要

PROBLEM TO BE SOLVED: To provide a resist material obtaining high resolving power corresponding to high definition of a resist pattern in recent years.

SOLUTION: This compound is represented by general formula (1) (wherein A is a sulfur atom or an iodine atom; Ar is an aromatic hydrocarbon group or a heterocyclic hydrocarbon group; B is a divalent functional group; R1and R2are each a hydrogen atom, an alkyl group, an alicyclic group, an aromatic hydrocarbon group or a heterocyclic hydrocarbon group; R3is an alkyl group, an alicyclic group, an aromatic hydrocarbon group or a heterocyclic hydrocarbon group; Y-is a counterion of A+; Z is an oxygen atom or a sulfur atom).

COPYRIGHT: (C)2007,JPO&INPIT