IMPRINT MOLD, MANUFACTURING PROCESS OF STRUCTURE BY IMPRINT MOLD, AND MANUFACTURING PROCESS OF MEMBER

摘要

PROBLEM TO BE SOLVED: To provide an imprint mold capable of forming a pattern of an area larger than the area of the mold with reduced seams or seamlessly on the surface of a substrate. SOLUTION: The imprint mold comprises a first pattern area configured by a plurality of first recesses, and a second pattern area configured by a plurality of second recesses for being used as an alignment mark. The first pattern area and the second pattern area have an equal height at their outermost surfaces, the first recesses and the second recesses have different depths each other, and the first pattern area and the second pattern area mutually have an equal cyclic interval. COPYRIGHT: (C)2007,JPO&INPIT